Supplying, Installing, Operating, And Training For Advanced Coating Complete Center Including Design And Installation Of Class 1000 Clean Room (PECVD)
Stage 1 : Supplying, Installation, Commissioning, and O&M for the Following:
Customer Name :
Central Metallurgical Research &Development Institute (CMRDI)
Tasks :
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Customer requirements study, analysis, systems selection.
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System supply, installation and operation.
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System clean room design and installation and operation.
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Plasma surface technology has the ability to change the surface of materials to the microscopic level, giving them different characteristics.
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PECVD uses RF energy to generate a glow discharge (PLASMA) of gas mixture to form reactive radicals, ions, neutral atoms and molecules. These atomic and molecules fragments interact with a substrate to make reactive etching or deposition processes.
Solar Cell: Amorphous Silicon Deposition Anti- Reflection and Anti-Scratch Layers: (Oxides, Nitrides, Oxynitrite, Carbides) Carbon Nanotube (CNT) Semiconductors: Low temperature thin film deposition on the semiconductors.
